Possibility of fabrication of photomasks by electron beam lithography on our or provided substrates.
Mask parameters:
- Substrate size 5 “or 7”
- Substrate material – glass
- Resolution of the layout starting from 1 µm
- Chromium layer thickness 100 nm
It is possible to choose a different thickness of the chrome layer, a different base material and to obtain a higher resolution.
Contact details:
SEMINSYS Group
Mateusz Słowikowski
mateusz.slowikowski@pw.edu.pl
