Possibility of fabrication of photomasks by electron beam lithography on our or provided substrates.

Mask parameters:

  • Substrate size 5 “or 7”
  • Substrate material – glass
  • Resolution of the layout starting from 1 µm
  • Chromium layer thickness 100 nm

It is possible to choose a different thickness of the chrome layer, a different base material and to obtain a higher resolution.

Contact details:


Mateusz Słowikowski

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