PECVD (Plasma Enhanced Chemical Vapour Deposition) PlasmaPro 100 is designed to produce excellent uniformity and high rate films for nanoelectronics and photonics

Technical specification

• Vacuum loadlock for high throughput
• Plasma generators: RF 13,56 MHz and 50-450 kHz
• In-situ chamber cleaning (optical emision spectra)
• Compatible with all wafer sizes up to 200 mm

Application

• High quality layers of amorphous silicon(a-Si), silicon dioxide (SiO2), silicon nitride (SiNx), silicon oxy-nitride (SiOxNy) with controlled stoichiometry and stress