PECVD (Plasma Enhanced Chemical Vapour Deposition) PlasmaPro 100 is designed to produce excellent uniformity and high rate films for nanoelectronics and photonics

Technical specification

  • Vacuum loadlock for high throughput
  • Plasma generators: RF 13,56 MHz and 50-450 kHz
  • In-situ chamber cleaning (optical emision spectra)
  • Compatible with all wafer sizes up to 200 mm


  • High quality layers of amorphous silicon(a-Si), silicon dioxide (SiO2), silicon nitride (SiNx), silicon oxy-nitride (SiOxNy) with controlled stoichiometry and stress

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